Surface reactions during etching of organic low-k films by...

Journal of Applied Physics 2006 Vol. 99; Iss. 8

Surface reactions during etching of organic low-k films by plasmas of N[sub 2] and H[sub 2]

Ishikawa, Kenji, Yamaoka, Yoshikazu, Nakamura, Moritaka, Yamazaki, Yuichi, Yamasaki, Satoshi, Ishikawa, Yasushi, Samukawa, Seiji
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Volume:
99
Year:
2006
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2191567
File:
PDF, 446 KB
english, 2006
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