Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2010 Vol. 28; Iss. 6
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Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept
Petric, Paul, Bevis, Chris, McCord, Mark, Carroll, Allen, Brodie, Alan, Ummethala, Upendra, Grella, Luca, Cheung, Anthony, Freed, ReginaVolume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3511436
File:
PDF, 1.11 MB
english, 2010