Deposition and characterization of amorphous aluminum...

Thin Solid Films 2015 / 01 Vol. 574

Deposition and characterization of amorphous aluminum nitride thin films for a gate insulator

Oikawa, H., Akiyama, R., Kanazawa, K., Kuroda, S., Harayama, I., Nagashima, K., Sekiba, D., Ashizawa, Y., Tsukamoto, A., Nakagawa, K., Ota, N.
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Volume:
574
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.11.081
Date:
January, 2015
File:
PDF, 1.04 MB
english, 2015
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