[IEEE Proceedings of the IEEE 2006 International Interconnect Technology Conference - Burlingame, CA (2006.06.5-2006.06.7)] 2006 International Interconnect Technology Conference - New low k a-SiC:H dielectric barrier for advanced interconnects
Favennec, L., Jousseaume, V., Zenasni, A., Bouchu, D., Passemard, G.Year:
2006
Language:
english
DOI:
10.1109/iitc.2006.1648660
File:
PDF, 622 KB
english, 2006