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Simulation of influence of particles on photoresist films for lithography
Kamoshida, Mototaka, Inui, Hirotomo, Ohta, Toshiyuki, Kasama, KunihikoVolume:
77
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.358750
File:
PDF, 738 KB
english, 1995