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On-line monitoring of perfluoro compounds in exhaust gases during semiconductor manufacture: Use of Li[sup +] ion attachment mass spectrometry
Fujii, Toshihiro, Nakamura, MegumiVolume:
90
Year:
2001
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1384857
File:
PDF, 359 KB
english, 2001