The influence of substrate temperature on the hydrogenated...

Materials Science in Semiconductor Processing 2015 / 10 Vol. 38

The influence of substrate temperature on the hydrogenated microcrystalline silicon growth through hollow cathode plasma

Ge, Teng, Wang, Zhengduo, Chen, Jiuxiang, Zhang, Shouye, Shi, Jilong, Chen, Qiang
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Volume:
38
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2014.11.027
Date:
October, 2015
File:
PDF, 3.59 MB
english, 2015
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