Thermal and plasma wave depth profiling in silicon

Applied Physics Letters 1985 Vol. 47; Iss. 5

Thermal and plasma wave depth profiling in silicon

Opsal, Jon, Rosencwaig, Allan
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Volume:
47
Year:
1985
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.96105
File:
PDF, 529 KB
english, 1985
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