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Behavior and effects of fluorine in annealed n[sup +] polycrystalline silicon layers on silicon wafers
Marsh, C. D., Moiseiwitsch, N. E., Booker, G. R., Ashburn, P.Volume:
87
Year:
2000
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.373023
File:
PDF, 745 KB
english, 2000