Investigation of triethylarsenic as a replacement for arsine in the metalorganic chemical vapor deposition of GaAs
Lum, R. M., Klingert, J. K., Wynn, A. S., Lamont, M. G.Volume:
52
Year:
1988
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.99103
File:
PDF, 638 KB
english, 1988