Interactions of chlorine plasmas with silicon chloride-coated reactor walls during and after silicon etching
Khare, Rohit, Srivastava, Ashutosh, Donnelly, Vincent M.Volume:
30
Year:
2012
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4742319
File:
PDF, 3.14 MB
english, 2012