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Ultrathin silicon oxide film on Si(100) fabricated by highly concentrated ozone at atmospheric pressure
Nakamura, K., Ichimura, S., Kurokawa, A., Koike, K., Inoue, G., Fukuda, T.Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581808
File:
PDF, 328 KB
english, 1999