Observation of internal structure of a positive photoresist...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 1989 / 5 Vol. 7; Iss. 3

Observation of internal structure of a positive photoresist image using cross-sectional exposure method

Uetani, Yasunori
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Volume:
7
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.584787
Date:
May, 1989
File:
PDF, 612 KB
english, 1989
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