Recessed area patterning via nanoimprint lithography

Recessed area patterning via nanoimprint lithography

Chong, Karen S. L., Lee, Yeong-Yuh, Yee Low, Hong
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Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3660393
File:
PDF, 1.53 MB
english, 2011
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