In situ characterization of plasma-deposited a-C:H thin films by spectroscopic infrared ellipsometry
Friedl, A., Fukarek, W., Möller, W., Koch, A.Volume:
65
Year:
1994
Language:
english
Journal:
Review of Scientific Instruments
DOI:
10.1063/1.1144632
File:
PDF, 1.23 MB
english, 1994