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[IEEE International Electron Devices Meeting 1999. Technical Digest - Washington, DC, USA (5-8 Dec. 1999)] International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318) - 50 nm gate-length CMOS transistor with super-halo: design, process, and reliability
Bin Yu,, Haihong Wang,, Milic, O., Qi Xiang,, Weizhong Wang,, An, J.X., Ming-Ren Lin,Year:
1999
Language:
english
DOI:
10.1109/iedm.1999.824237
File:
PDF, 343 KB
english, 1999