Annealing of ultrashallow p[sup +]/n junction by 248 nm excimer laser and rapid thermal processing with different preamorphization depths
Y. F. Chong, K. L. Pey, A. T. S. Wee, A. See, L. Chan, Y. F. Lu, W. D. Song, L. H. ChuaYear:
2000
Language:
english
DOI:
10.1063/1.126627
File:
PDF, 327 KB
english, 2000