Reactive ion etching of SiGe alloys using HBr

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Reactive ion etching of SiGe alloys using HBr

T. D. Bestwick, G. S. Oehrlein, Y. Zhang, G. M. W. Kroesen, E. De Frésart
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Year:
1991
Language:
english
DOI:
10.1063/1.105588
File:
PDF, 676 KB
english, 1991
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