[IEEE Symposium on VLSI Technology - Kyoto, Japan (1997.06.12-1997.06.12)] Symposium on VLSI Technology - Lissajous Electron Plasma Etching For Sub-half Micron LSI
Ohkuni,, Kubota,, Nakayama,, Eriguchi,, Tamaki,, Harafuji,, Nomura,, Sivaram,Year:
1993
Language:
english
DOI:
10.1109/vlsit.1993.760293
File:
PDF, 344 KB
english, 1993