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Nanoporosity induced by ion implantation in deposited amorphous Ge thin films
Romano, L., Impellizzeri, G., Bosco, L., Ruffino, F., Miritello, M., Grimaldi, M. G.Volume:
111
Year:
2012
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4725427
File:
PDF, 1.73 MB
english, 2012