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Accurate argon cluster-ion sputter yields: Measured yields and effect of the sputter threshold in practical depth-profiling by x-ray photoelectron spectroscopy and secondary ion mass spectrometry
Cumpson, Peter J., Portoles, Jose F., Barlow, Anders J., Sano, NaokoVolume:
114
Year:
2013
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4823815
File:
PDF, 789 KB
english, 2013