![](/img/cover-not-exists.png)
Random-walk mechanism for step retraction on hydrogen-etched Si(111)
Larsson, Mats I., Bethge, Heidrun, Köhler, Ulrich, Menke, Stefan, Henzler, MartinVolume:
56
Language:
english
Journal:
Physical Review B
DOI:
10.1103/PhysRevB.56.1021
Date:
July, 1997
File:
PDF, 382 KB
english, 1997