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Process dependence of 1/f noise and defects in ion implanted p-type piezoresistors
Dieme, Robert, Zhang, Jack, Rudawski, Nicholas G., Jones, Kevin, Bosman, Gijs, Sheplak, Mark, Nishida, ToshikazuVolume:
112
Year:
2012
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4740221
File:
PDF, 1.15 MB
english, 2012