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Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films
K. Kukli, J. Aarik, M. Ritala, T. Uustare, T. Sajavaara, J. Lu, J. Sundqvist, A. Aidla, L. Pung, A. Hårsta, M. LeskeläYear:
2004
Language:
english
DOI:
10.1063/1.1796513
File:
PDF, 620 KB
english, 2004