Secondary ion mass spectrometry characterization of...

Applied Surface Science 2004 Vol. 231-232; Iss. none

Secondary ion mass spectrometry characterization of indium-implanted silicon wafers

C. Blackmer-Krasinski, W.R. Morinville
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Volume:
231-232
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.apsusc.2004.03.039
File:
PDF, 256 KB
english, 2004
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