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ToF-SIMS profiling of HfO2/Si stacks: influence of sputtering condition of profile shape
T. Conard, C. Huyghebaert, W. VandervorstVolume:
231-232
Year:
2004
Language:
english
Pages:
7
DOI:
10.1016/j.apsusc.2004.03.108
File:
PDF, 163 KB
english, 2004