![](/img/cover-not-exists.png)
ToF-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides
L. Houssiau, R.G. Vitchev, T. Conard, W. Vandervorst, H. BenderVolume:
231-232
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.apsusc.2004.03.112
File:
PDF, 171 KB
english, 2004