O2+ versus Cs+ for high depth resolution depth profiling of III–V nitride-based semiconductor devices
M. Kachan, J. Hunter, D. Kouzminov, A. Pivovarov, J. Gu, F. Stevie, D. GriffisVolume:
231-232
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.apsusc.2004.03.211
File:
PDF, 187 KB
english, 2004