Ge–Si–O phase separation and Ge nanocrystal growth in...

Nanotechnology 2011 / 12 Vol. 22; Iss. 48

Ge–Si–O phase separation and Ge nanocrystal growth in Ge:SiO x / SiO 2 multilayers—a new dc magnetron approach

Zschintzsch, Manuel, Sahle, Christoph J, Borany, Johannes von, Sternemann, Christian, Mücklich, Arndt, Nyrow, Alexander, Schwamberger, Alexander, Tolan, Metin
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Volume:
22
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/22/48/485303
Date:
December, 2011
File:
PDF, 1.43 MB
english, 2011
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