Electrical and reliability characteristics of HfO2 gate dielectric treated in N2 and NH3 plasma atmosphere
Jeon-Ho Kim, Kyu-Jeong Choi, Soon-Gil YoonVolume:
242
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.apsusc.2004.08.026
File:
PDF, 142 KB
english, 2005