Influence of Phosphorus Doping in the Active Layer with...

Molecular Crystals and Liquid Crystals 2011 / 11 Vol. 550; Iss. 1

Influence of Phosphorus Doping in the Active Layer with Deposition Time and Gas Flow Rate in a-Si:H Thin Film Transistor

Kim, Byung-Ju, Lee, Sang-Kwon, Kim, Ae-Ri, Choi, Sie-Young
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Volume:
550
Language:
english
Journal:
Molecular Crystals and Liquid Crystals
DOI:
10.1080/15421406.2011.600590
Date:
November, 2011
File:
PDF, 819 KB
english, 2011
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