Preparation of fluorocarbon thin film deposited by soft...

Preparation of fluorocarbon thin film deposited by soft X-ray ablation and its electrical characteristics and thermal stability

Takeshi Kanashima, Osamu Maida, Norihiro Kohma, Masaki Okumoto, Masato Ueno, Satoshi Kitai, Masanori Okuyama, Haruhiko Ohashi, Yusuke Tamenori
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Volume:
252
Year:
2006
Language:
english
Pages:
7
DOI:
10.1016/j.apsusc.2005.06.055
File:
PDF, 669 KB
english, 2006
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