thin films prepared by rf plasma-enhanced chemical vapor deposition
Dawei, Wu, Dejun, Fu, Huaixi, Guo, Zhihong, Zhang, Xianquan, Meng, Xiangjun, FanVolume:
56
Language:
english
Journal:
Physical Review B
DOI:
10.1103/PhysRevB.56.4949
Date:
August, 1997
File:
PDF, 184 KB
english, 1997