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Influence of the normalized ion flux on the constitution of alumina films deposited by plasma-assisted chemical vapor deposition
D. Kurapov, J. Reiss, D. H. Trinh, L. Hultman, J. M. SchneiderYear:
2007
Language:
english
DOI:
10.1116/1.2748802
File:
PDF, 1.02 MB
english, 2007