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[IEEE 2010 OSA-IEEE-COS Advances in Optoelectronics and Micro/Nano-Optics (AOM) - Guangzhou, China (2010.12.3-2010.12.6)] Advances in Optoelectronics and Micro/nano-optics - Sensitivity analysis for nanostructure metrology by Mueller matrix polarimetry
Yuan Ma,, Shiyuan Liu,, Chuanwei Zhang,, Xiuguo Chen,Year:
2010
Language:
english
DOI:
10.1109/aom.2010.5713584
File:
PDF, 245 KB
english, 2010