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Effect of gas residence time on the morphology of silicon surface etched in SF6 plasmas
R.S. Pessoa, H.S. Maciel, G. Petraconi, M. Massi, A.S. da Silva SobrinhoVolume:
255
Year:
2008
Language:
english
Pages:
3
DOI:
10.1016/j.apsusc.2008.07.057
File:
PDF, 408 KB
english, 2008