Kinetics of chemical vapor deposition of SiC from...

Applied Surface Science 2009 Vol. 255; Iss. 17

Kinetics of chemical vapor deposition of SiC from methyltrichlorosilane and hydrogen

Cuiying Lu, Laifei Cheng, Chunnian Zhao, Litong Zhang, Yongdong Xu
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Volume:
255
Year:
2009
Language:
english
Pages:
5
DOI:
10.1016/j.apsusc.2009.03.069
File:
PDF, 320 KB
english, 2009
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