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Role of the MOCVD deposition conditions on physico-chemical properties of tetragonal ZrO2 thin films
K. Galicka-Fau, C. Legros, M. Andrieux, M. Brunet, J. Szade, G. GarryVolume:
255
Year:
2009
Language:
english
Pages:
9
DOI:
10.1016/j.apsusc.2009.06.067
File:
PDF, 926 KB
english, 2009