Thermal relaxation of the deposition-induced nonequilibrium...

Physical Review B 1994 / 4 Vol. 49; Iss. 15

Thermal relaxation of the deposition-induced nonequilibrium state and steady-state defect density in hydrogenated amorphous silicon

Yoon, Jong-Hwan, Lee, Yoon-Zik, Park, H. R.
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Volume:
49
Language:
english
Journal:
Physical Review B
DOI:
10.1103/PhysRevB.49.10303
Date:
April, 1994
File:
PDF, 174 KB
english, 1994
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