First principles study of Si etching by CHF3 plasma source
Weichao Wang, Pil-Ryung Cha, Sang ho Lee, Gyoodong Kim, Moon J. Kim, Kyeongjae ChoVolume:
257
Year:
2011
Language:
english
Pages:
5
DOI:
10.1016/j.apsusc.2011.03.147
File:
PDF, 607 KB
english, 2011