Polishing behavior of PS/CeO2 hybrid microspheres with...

Polishing behavior of PS/CeO2 hybrid microspheres with controlled shell thickness on silicon dioxide CMP

Yang Chen, Renwei Long
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Volume:
257
Year:
2011
Language:
english
Pages:
7
DOI:
10.1016/j.apsusc.2011.05.047
File:
PDF, 1.51 MB
english, 2011
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