High Aspect Ratio PS- b -PMMA...

ACS Applied Materials & Interfaces 2014 / 12 Vol. 6; Iss. 23

High Aspect Ratio PS- b -PMMA Block Copolymer Masks for Lithographic Applications

Ferrarese Lupi, F., Giammaria, T. J., Volpe, F. G., Lotto, F., Seguini, G., Pivac, B., Laus, M., Perego, M.
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Volume:
6
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am506391n
Date:
December, 2014
File:
PDF, 2.30 MB
english, 2014
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