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[IEEE SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Cambridge, MA, USA (13-15 Nov. 1995)] Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Rapid thermal processing (RTP) applied to ion implant anneal for 0.25 μm technology
Hossain, S.D., Pas, M.F., Miner, G., Cleavelin, C.R.Year:
1995
Language:
english
DOI:
10.1109/asmc.1995.484327
File:
PDF, 250 KB
english, 1995