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[IEEE IEEE 2005 International Interconnect Technology Conference - Burlingame, CA, USA (6-8 June 2005)] Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005. - An analysis of the effect of wire resistance on circuit level performance at the 45-nm technology node
Nguyen, V.H., Christie, P., Heringa, A., Kumar, A., Ng, R.Year:
2005
Language:
english
DOI:
10.1109/iitc.2005.1499976
File:
PDF, 478 KB
english, 2005