[IEEE International Electron Devices Meeting - Washington,...

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[IEEE International Electron Devices Meeting - Washington, DC, USA (10-13 Dec. 1995)] Proceedings of International Electron Devices Meeting - A novel 0.25 μm CMOS technology for 6.82 μm/sup 2/ 6-Tr. SRAM cell with elevated trench isolation and line-and-space shaped gates (ETILS)

Nakabayashi, T., Uehara, T., Segawa, M., Ukeda, T., Yamanaka, M., Yamada, T., Arai, M., Yabu, T., Yamashita, K., Kobayashi, S., Murakami, T., Saeki, M., Okuyama, H., Kanda, A., Ogura, M.
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Year:
1995
Language:
english
DOI:
10.1109/iedm.1995.499388
File:
PDF, 441 KB
english, 1995
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