Characteristics of n-GaN After Cl 2...

Japanese Journal of Applied Physics 2003 / 10 Vol. 42; Iss. Part 1, No

Characteristics of n-GaN After Cl 2 /Ar and Cl 2 /N 2 Inductively Coupled Plasma Etching

Han, Yan-Jun, Xue, Song, Guo, Wen-Ping, Sun, Chang-Zheng, Hao, Zhi-Biao, Luo, Yi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.6409
Date:
October, 2003
File:
PDF, 123 KB
english, 2003
Conversion to is in progress
Conversion to is failed