Thermal stability of nitrogen incorporated in HfN[sub...

  • Main
  • Thermal stability of nitrogen...

Thermal stability of nitrogen incorporated in HfN[sub x]O[sub y] gate dielectrics prepared by reactive sputtering

J. F. Kang, H. Y. Yu, C. Ren, M. Li, D. S. H. Chan, H. Hu, H. F. Lim, W. D. Wang, D. Gui, D. Kwong
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2004
Language:
english
DOI:
10.1063/1.1651652
File:
PDF, 330 KB
english, 2004
Conversion to is in progress
Conversion to is failed