Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide
Kim, Jong Kyu, Cho, Sung Il, Kim, Nam Gun, Jhon, Myung S., Min, Kyung Suk, Kim, Chan Kyu, Yeom, Geun YoungVolume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4780122
File:
PDF, 1.61 MB
english, 2013