Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2010 Vol. 28; Iss. 1
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Deactivation of submelt laser annealed arsenic ultrashallow junctions in silicon during subsequent thermal treatment
Giubertoni, Damiano, Pepponi, Giancarlo, Sahiner, Mehmet Alper, Kelty, Stephen P., Gennaro, Salvatore, Bersani, Massimo, Kah, Max, Kirkby, Karen J., Doherty, Roisin, Foad, Majeed A., Meirer, F., StrelVolume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3242637
File:
PDF, 659 KB
english, 2010