Focused ion beam nanolithography on AlF[sub 3] at a 10 nm...

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Focused ion beam nanolithography on AlF[sub 3] at a 10 nm scale

J. Gierak, C. Vieu, H. Launois, G. B. Assayag, A. Septier
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Year:
1997
Language:
english
DOI:
10.1063/1.118810
File:
PDF, 2.89 MB
english, 1997
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